DOOR TYPE PLANAR MAGNETRON SPUTTERING SOURCE OF VACUUM DEPOSITION COATING APPARATUS

摘要

PURPOSE: A door type planar magnetron sputtering source of vacuum deposition coating apparatus is provided to reduce racing ratio due to target replacement and increase efficiency of replacement operation by easily performing replacement of the magnetron sputtering source. CONSTITUTION: The door type planar magnetron sputtering source(30) of vacuum deposition coating apparatus comprises a flange(35) installed at the outer side of a source hole(33) formed on chamber body(32) composing vacuum chamber(31); a rectangular source body(41) fixed from the outer side of the flange(35) by an insulated bolt(42) with a rectangular insulating material(40) being interposed between the inner side of the flange(35) and source body(41); a target(45) indirectly cooling fixed to the upper part of the source body(41) to coat an object; and a magnet(47) fixed to magnet base(48) in a space(46) between the source body(41) and target(45) to enable oscillation required for evaporating the target(45), wherein the magnet base(48) is fixed to insulation base(49) formed in the lower side of the magnet base(48) by insulated bolts(50), and the insulation base(49) is connected to cutoff plate(52) fixed to the flange(35) by fixing bolt(53) to obtain electrical stability.