发明名称 |
SETTING METHOD, SETTING PROGRAM AND SETTING DEVICE FOR PARAMETER CONTROL VALUE IN SEMICONDUCTOR MANUFACTURING PROCESS |
摘要 |
PROBLEM TO BE SOLVED: To shorten a time until the yield of a semiconductor product is improved or stabilized by analytically setting a parameter control value in each process of a semiconductor manufacturing line. SOLUTION: The setting method of the parameter control value in the semiconductor manufacturing process comprises an initial setting process 2 setting an arbitrary initial value as the control value of the parameter in the semiconductor manufacturing processes A<SB>1</SB>-AN; an estimating process 3 estimating the characteristic value of a semiconductor product based on the set parameter control value; a difference calculating process 4 obtaining a difference between the estimated characteristic value and a preset target value of the semiconductor product; and a correcting process 9 obtaining the correcting amount of the parameter control value in the semiconductor manufacturing process A<SB>1</SB>-AN based on a difference between the estimated characteristic value and the target value to correct the set parameter control value when the difference between the estimated characteristic value and the target value is not within a predetermined range. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003209035(A) |
申请公布日期 |
2003.07.25 |
申请号 |
JP20020008929 |
申请日期 |
2002.01.17 |
申请人 |
TOSHIBA CORP |
发明人 |
KANO MAKOTO |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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