| 摘要 |
PROBLEM TO BE SOLVED: To improve throughput in a semiconductor manufacturing apparatus including a plurality of film forming chambers by performing cleaning treatment without making other film forming chambers wait while one detoxifying apparatus is used. SOLUTION: The semiconductor manufacturing apparatus comprises a plurality of chambers 1, 2, etc. Exhaust lines 31, 32 of the chamber 1, 2 are respectively connected to one unit of a detoxifying apparatus 20. When either of chambers 1, 2 has entered the timing of cleaning, the cleaning treatment is performed to the chamber 1 which has entered the timing of cleaning and the other chamber 2. COPYRIGHT: (C)2003,JPO
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