HEAT TREATMENT METHOD AND APPARATUS FOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a heat treatment method for performing sufficiently uniform heat treatment to a silicon film on a glass substrate. SOLUTION: A heat diffusing plate 73 and a heating plate 74 are provided in this sequence within a heat treatment chamber 65. The heating plate 74 is provided to preliminarily heat the glass substrate W to temperatures ranging from 200°C to 400°C. The preheated glass substrate W is heat-treated with the radiation of the flash of a xenon flash lamp 69. With the radiation of flash, an amorphous silicon film on the glass substrate W is heated uniformly and thereby plycrystallized. COPYRIGHT: (C)2003,JPO