POSITIVE PHOTOSENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which suppresses development defects and is excellent in stability to PED (post-exposure time delay).

SOLUTION: The positive photosensitive composition is characterized in containing (A) at least one compound which generates an aromatic sulfonic acid substituted by at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation with an actinic ray or a radiation, (B) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution and (C) a compound having three or more hydroxyl groups or substituted hydroxyl groups and at least one cyclic structure.

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