发明名称 SEMICONDUCTOR LIGHT EMITTING ELEMENT AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To increase light extraction efficiency by preventing deterioration of light extraction efficiency which is to be caused by influence of total refection on a boundary between the uppermost layer of a semiconductor multilayer film and transparent resin. <P>SOLUTION: In an LED, a double heterostructure wherein an InGaAlP active layer 13 is sandwiched between an n-type InAlP clad layer 12 and a p-type InAlP clad layer 14 is formed on an n-type GaAs substrate 10 of a face whose plane direction is (100), p-type GaAlAs current diffusion layers 15, 17 are formed on the double heterostructure, and a light is led out from a surface opposite to the substrate 10. A surface which is a (100) face of the current diffusion layer 17 on a light extraction surface side of the double heterostructure is worked, a (111) face is exposed, HCI treatment is performed to the exposed (111) face, and fine unevenness is formed. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003209283(A) 申请公布日期 2003.07.25
申请号 JP20020006452 申请日期 2002.01.15
申请人 TOSHIBA CORP 发明人 YOSHITAKE HARUJI;TAKAHASHI KOICHI;NUNOTANI NOBUHITO;OHASHI KENICHI
分类号 H01L33/14;H01L33/16;H01L33/22;H01L33/30;H01S5/183 主分类号 H01L33/14
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