| 摘要 |
PROBLEM TO BE SOLVED: To measure the potential distribution of a semi-insulating film on a real device of a semiconductor device in a method for measuring the potential distribution of the semi-insulating film. SOLUTION: A first electrode and a second electrode are formed at arbitrary positions of a semi-insulating film formed on a semiconductor substrate away by a predetermined distance or more, and at least one or more measuring electrodes are disposed at predetermined positions on the semi-insulating film between the first electrode and the second electrode. When a predetermined DC voltage is applied between the first electrode and the second electrode, the measuring potential of the measuring electrode is detected, thereby acquiring the potential distribution of the semi-insulating film. COPYRIGHT: (C)2003,JPO
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