| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of projections for liquid crystal layer alignment control which can improve the uniformity of the size of the projections for liquid crystal layer alignment control in the top surface of a substrate. <P>SOLUTION: In order to improve the uniformity of the projection size in the substrate top surface, an exposure quantity E is set to 1 to 3 times as large as the complete dissolution exposure quantity E0 (exposure quantity for eliminating the thickness of a resist after development) of a positive type photoresist in development processing. In this case, the in-surface uniformity of the size of the projection CF1 (TS1) can be made better than when the positive type photoresist is exposed by a quantity which is equal to the complete dissolution exposure quantity or three or more times as large as the one. <P>COPYRIGHT: (C)2003,JPO |
