METHOD OF MANUFACTURING SILICON CRYSTALLINE THIN FILM

摘要

PROBLEM TO BE SOLVED: To enable the formation of a high-quality crystalline silicon thin film on a substrate of a different kind at a low cost.

SOLUTION: An undercoat layer (2) is formed on a substrate (1) for formation of a thin film. A crystalline layer (3) is formed on a part or whole of the top thereof, and a fixing substrate (4) is bonded on top thereof. Then these are separated from the substrate (1) by removing the undercoat layer (2) to obtain a silicon crystalline thin film integrally formed with the fixing substrate (4).

COPYRIGHT: (C)2003,JPO