| 摘要 |
PROBLEM TO BE SOLVED: To respond needs of restraining the amount of treatment liquid consumption while miniaturizing and simplifying a device and, further, reducing the amount of grinding in a grinding process or eliminating the grinding process itself even when a film is formed on the surface of a substrate having a recessed and projected pattern. SOLUTION: The substrate treatment device is equipped with a substrate holder 12 for detachably retaining the substrate 10, a flat plate 14 having a flat surface unit 14a arranged at a position facing the surface 10a of the substrate 10 retained by the substrate holder 12, and a moving mechanism 20 for moving the flat plate 14 with a small step to change a distance g between the substrate 10 retained by the substrate holder 12 and the flat plate 14. COPYRIGHT: (C)2003,JPO |
