| 摘要 |
<p>Apparatus (20) for processing a surface (21) of a substrate (22) includes a chamber (26) containing a cavity (33) that has one side that is open, the chamber (26) wall including a lip (31) surrounding the open side of the cavity (33). Gas ports, disposed within the chamber (26) wall and opening through the lip (31), emit a pressurized gas so as to create a gas cushion between the lip (31) and the surface (21) when the open side of the cavity (33) is placed adjacent to the surface (21), thus creating a seal between the cavity (33) and an environment external to the chamber (26).</p> |
