发明名称 |
THIN FILMS AND METHODS FOR THE PREPARATION THEREOF |
摘要 |
An organosiloxane material, which exhibits both inorganic and organic bonds within a cured and at least partially cross-linked siloxane composition to give a product which has excellent strength properties and good heat-resistance. The new materials are obtained by reacting a first silane compound containing an unsaturated hydrocarbon residue, which will provide for organic cross-linking, and a second silane compound containing at least one aryl group. The new materials can be used as thin films, e.g. as dielectrics in integrated circuits.
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申请公布号 |
WO03059990(A1) |
申请公布日期 |
2003.07.24 |
申请号 |
WO2003FI00036 |
申请日期 |
2003.01.17 |
申请人 |
SILECS OY;RANTALA, JUHA;TOERMAENEN, TURO;VISWANATHAN, NUNGAVARAM;REID, JASON |
发明人 |
RANTALA, JUHA;TOERMAENEN, TURO;VISWANATHAN, NUNGAVARAM;REID, JASON |
分类号 |
C07F7/08;C07F7/12;C07F7/18;H01L21/312;H01L21/316;(IPC1-7):C08G77/04;C08G77/20;C09D183/04;H01L21/31 |
主分类号 |
C07F7/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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