发明名称 THIN FILMS AND METHODS FOR THE PREPARATION THEREOF
摘要 An organosiloxane material, which exhibits both inorganic and organic bonds within a cured and at least partially cross-linked siloxane composition to give a product which has excellent strength properties and good heat-resistance. The new materials are obtained by reacting a first silane compound containing an unsaturated hydrocarbon residue, which will provide for organic cross-linking, and a second silane compound containing at least one aryl group. The new materials can be used as thin films, e.g. as dielectrics in integrated circuits.
申请公布号 WO03059990(A1) 申请公布日期 2003.07.24
申请号 WO2003FI00036 申请日期 2003.01.17
申请人 SILECS OY;RANTALA, JUHA;TOERMAENEN, TURO;VISWANATHAN, NUNGAVARAM;REID, JASON 发明人 RANTALA, JUHA;TOERMAENEN, TURO;VISWANATHAN, NUNGAVARAM;REID, JASON
分类号 C07F7/08;C07F7/12;C07F7/18;H01L21/312;H01L21/316;(IPC1-7):C08G77/04;C08G77/20;C09D183/04;H01L21/31 主分类号 C07F7/08
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