发明名称 NONSTICK LAYER FOR A MICROMECHANICAL COMPONENT
摘要 The invention proposes a method for manufacturing micromechanical components, and a micromechanical component, in which a movable element (4) is produced on a sacrificial layer (2). In a subsequent step the sacrificial layer (2) beneath the movable element (4) is removed so that the movable element (4) becomes movable. After removal of the sacrificial layer (2), a protective layer (7) is deposited on a surface of the movable element (4). Silicon oxide and/or silicon nitride is used for the protective layer (7).
申请公布号 US2003139040(A1) 申请公布日期 2003.07.24
申请号 US20000445374 申请日期 2000.03.02
申请人 SCHOEFTHALER MARTIN;HEIN PETER;SKAPA HELMUT;MUENZEL HORST 发明人 SCHOEFTHALER MARTIN;HEIN PETER;SKAPA HELMUT;MUENZEL HORST
分类号 G01P15/125;B81B3/00;B81B7/00;B81C1/00;G01P1/02;G01P15/08;(IPC1-7):B44C1/22;C03C15/00;C03C25/68;H01L21/302;H01L21/461 主分类号 G01P15/125
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