发明名称 |
NONSTICK LAYER FOR A MICROMECHANICAL COMPONENT |
摘要 |
The invention proposes a method for manufacturing micromechanical components, and a micromechanical component, in which a movable element (4) is produced on a sacrificial layer (2). In a subsequent step the sacrificial layer (2) beneath the movable element (4) is removed so that the movable element (4) becomes movable. After removal of the sacrificial layer (2), a protective layer (7) is deposited on a surface of the movable element (4). Silicon oxide and/or silicon nitride is used for the protective layer (7).
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申请公布号 |
US2003139040(A1) |
申请公布日期 |
2003.07.24 |
申请号 |
US20000445374 |
申请日期 |
2000.03.02 |
申请人 |
SCHOEFTHALER MARTIN;HEIN PETER;SKAPA HELMUT;MUENZEL HORST |
发明人 |
SCHOEFTHALER MARTIN;HEIN PETER;SKAPA HELMUT;MUENZEL HORST |
分类号 |
G01P15/125;B81B3/00;B81B7/00;B81C1/00;G01P1/02;G01P15/08;(IPC1-7):B44C1/22;C03C15/00;C03C25/68;H01L21/302;H01L21/461 |
主分类号 |
G01P15/125 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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