发明名称 |
HIGHLY PURE ULTRA-FINE SiOX POWDER AND METHOD FOR PRODUCTION THEREOF |
摘要 |
<p>A highly pure ultra-fine SiOX powder, characterized in that it is represented by the formula: wherein x is 0.6 to 1.8, has a specific surface area of 10 m2/g or more and contains Na, Fe, Al and Cl in a total amount of 10 ppm or less; and a method for producing the above SiOX powder which comprises reacting a monosilane gas with a gas capable of oxidizing the monosilane gas in a non-oxidizing gas atmosphere under a pressure of 10 to 1000 kPa at 500 to 1000ringC. The amount of the non-oxidizing gas is preferably greater than that of the sum of the monosilane gas and oxygen participating in the oxidation of the monosilane gas.</p> |
申请公布号 |
WO03059816(A1) |
申请公布日期 |
2003.07.24 |
申请号 |
WO2003JP00158 |
申请日期 |
2003.01.10 |
申请人 |
DENKI KAGAKU KOGYO KABUSHIKI KAISHA;IMAMURA, YASUO;NONOGAKI, RYOZO |
发明人 |
IMAMURA, YASUO;NONOGAKI, RYOZO |
分类号 |
C01B33/18;C01B33/113;C04B35/14;C23C16/44;(IPC1-7):C01B33/113;G02B1/10;H01L21/316 |
主分类号 |
C01B33/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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