Device manufacturing-related apparatus, reticle, and device manufacturing method

摘要

A gas purge space such as a pellicle space is purged with inert gas within a short time in a projection exposure apparatus using an ultraviolet ray source such as a fluorine excimer laser as a light source. The pellicle frame of a reticle (20) with a pellicle is constituted by porous pellicle frame pieces (30a, 30b). Inert gas is supplied into a pellicle space (100) via the porous pellicle frame piece (30a). Inert gas is exhausted together with oxygen and the like in the pellicle space (100) via the porous pellicle frame piece (30b).