发明名称 |
Method of manufacturing electronic part, electronic part and electroless plating method |
摘要 |
A work piece is mixed with Ni pieces having an average diameter of 1 mm and exhibiting catalytic activity to oxidation reaction of sodium phosphinate (NaH2PO2) added as a reducing agent in a plating bath containing the reducing agent and a Ni salt to form a Ni-P film on an electrode made of Cu, Ag or Ag-Pd by auto-catalytic electroless plating. Then, the work piece is dipped in a plating bath containing an Au salt to form an Au film on the surface of the Ni-P film by substitutional electroless plating. This method is capable of forming a desired plating film only on a desired portion at a low cost.
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申请公布号 |
US2003138571(A1) |
申请公布日期 |
2003.07.24 |
申请号 |
US20020315949 |
申请日期 |
2002.12.11 |
申请人 |
KUNISHI TATSUO;NUMATA TOSHI;SAITOH JUNICHI;SAKABE YUKIO |
发明人 |
KUNISHI TATSUO;NUMATA TOSHI;SAITOH JUNICHI;SAKABE YUKIO |
分类号 |
C23C18/16;C23C18/31;C23C18/34;C23C18/44;C23C18/54;H01G4/232;H01G4/30;H05K3/24;(IPC1-7):B05D1/18;B05D5/12 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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