发明名称 |
Electrolytic processing device and substrate processing apparatus |
摘要 |
There is provided an electrolytic processing device including: a processing electrode brought into contact with or close to a workpiece; a feeding electrode for supplying electricity to the workpiece; an ion exchanger disposed in at least one of the spaces between the workpiece and the processing electrode, and between the workpiece and the feeding electrode; a power source for applying a voltage between the processing electrode and the feeding electrode; and a liquid supply section for supplying a liquid to the space between the workpiece and at least one of the processing electrode and the feeding electrode, in which the ion exchanger is present. A substrate processing apparatus having the electrolytic processing device is also provided.
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申请公布号 |
US2003136668(A1) |
申请公布日期 |
2003.07.24 |
申请号 |
US20030337357 |
申请日期 |
2003.01.07 |
申请人 |
KOBATA ITSUKI;SHIRAKASHI MITSUHIKO;KUMEKAWA MASAYUKI;SAITO TAKAYUKI;TOMA YASUSHI;SUZUKI TSUKURU;YAMADA KAORU;MAKITA YUJI;YASUDA HOZUMI |
发明人 |
KOBATA ITSUKI;SHIRAKASHI MITSUHIKO;KUMEKAWA MASAYUKI;SAITO TAKAYUKI;TOMA YASUSHI;SUZUKI TSUKURU;YAMADA KAORU;MAKITA YUJI;YASUDA HOZUMI |
分类号 |
B23H5/08;C25C7/00;C25D17/00;(IPC1-7):C25D17/00 |
主分类号 |
B23H5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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