发明名称 Synthetic quartz glass blank
摘要 A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950° C. each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1x10-6. The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.
申请公布号 US2003138587(A1) 申请公布日期 2003.07.24
申请号 US20020315990 申请日期 2002.12.11
申请人 OTSUKA HISATOSHI;SHIROTA KAZUO;FUJINOKI AKIRA;NISHIMURA HIROYUKI;SHIMAKAWA TAKAYUKI 发明人 OTSUKA HISATOSHI;SHIROTA KAZUO;FUJINOKI AKIRA;NISHIMURA HIROYUKI;SHIMAKAWA TAKAYUKI
分类号 C03B19/14;C03C3/06;(IPC1-7):B32B3/02 主分类号 C03B19/14
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