| 发明名称 |
Wafer temperature detection device for ion implanter |
| 摘要 |
A wafer temperature detection device for an ion implanter including a dummy and a temperature detector. The dummy is disposed on a rotating disk where wafers are disposed to have ions implanted in the ion implanter and is made of a substantially identical material as that of the wafers. The temperature detector is provided on the dummy.
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| 申请公布号 |
US2003138028(A1) |
申请公布日期 |
2003.07.24 |
| 申请号 |
US20000549492 |
申请日期 |
2000.04.14 |
| 申请人 |
TAKAYAMA SEIJI;YANO TAKAYUKI;SUZUKI SATOSHI;MERA KAZUO;TOMITA HIROYUKI |
发明人 |
TAKAYAMA SEIJI;YANO TAKAYUKI;SUZUKI SATOSHI;MERA KAZUO;TOMITA HIROYUKI |
| 分类号 |
H01J37/317;G01K7/42;H01L21/265;(IPC1-7):G01K1/00 |
主分类号 |
H01J37/317 |
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