首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Verfahren zum Behandeln von Substraten
摘要
申请公布号
DE59808768(D1)
申请公布日期
2003.07.24
申请号
DE19985008768
申请日期
1998.11.18
申请人
STEAG MICROTECH GMBH
发明人
OSHINOWO, JOHN
分类号
H01L21/00;(IPC1-7):H01L21/00
主分类号
H01L21/00
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Approach to integrate Schottky in MOSFET
Capacitor contact formed concurrently with bond pad metallization
Method for fabricating semiconductor device
Portable high gain fluorescence detection system
Mutagenized strain of Glarea lozoyensis and a method of preparing a compound from the mutagenized strain
Method for the enzymatic production of fatty alcohol and/or fatty acid
beta1,3-N-acetyl-D-galactosamine transferase protein, nucleic acid encoding the same and method of examining canceration using the same
Fluorescence resonance energy transfer assays for sarco/endoplasmic reticulum calcium atpase and phospholamban
Methods for processing and analyzing nucleic acid samples
Radiation-sensitive resin composition
Method for manufacturing capsule toner
Polyester resin containing toner
Method of recycling image forming material
Fuel utilisation in electrochemical fuel cells
Low coefficient of thermal expansion (CTE) thermosetting resins for integrated circuit applications
Multilayer coextruded shrink labels of oriented polystyrene film containing small rubber particles and low rubber particle gel content and block copolymers
Method for the coating of a diesel particle filter and diesel particle filter produced thereby
Methods of forming electrically conductive structures
Transdermally absorbable preparation
Cathode materials and methods for production