发明名称 |
Exposure method and exposure apparatus |
摘要 |
An exposure method which irradiates a slit-shaped illumination light IL on a reticle Ri and a substrate while moving them synchronously so as to sequentially transfer images of patterns formed on the reticle Ri to the substrate 4, wherein a density filter Fj having an attenuating part for gradually reducing the distribution of illuminance of the illumination light IL is moved in synchronization with the movement of the reticle Ri.
|
申请公布号 |
US2003138742(A1) |
申请公布日期 |
2003.07.24 |
申请号 |
US20020298907 |
申请日期 |
2002.11.19 |
申请人 |
NIKON CORPORATION |
发明人 |
IRIE NOBUYUKI;MAGOME NOBUTAKA |
分类号 |
G03F7/20;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|