摘要 |
Apparatus, wherein a single lens, or aggregation of lenses in a substianlly columnar sequence, simultanelusly focuses two or more different energy band-regions in substantially the same focal plane. Wherein said apparatus includes a first element that is exposed to the incident dual waveband radiation, the first element is comprised of a first composition and has a finite thickness, a perimeter, a first index of refraction, and a first and second surface substantially perpendicular to said permiter. The first surface has a first geometry, or surface shape, and the second surface has a second geometry, or surface shape. The second element is comprised of a second compositon and has a thickness, a permiter, a second, and usually diferent, index of refraction, and a first and second surface substantially perpendicular to said permiter. The first surface has a third geometry and the second surface has a fourth geometry. The first and second element are aligned such that the second surface of the first elements and the firstsurface of the second element are in substantial conformity with each other and aligned in such a way the permiters essentially form a column. |
申请人 |
HRL LABORATORIES, LLC;DOLEZAL, FRANK;HARVEY, ROBIN, J. |
发明人 |
DOLEZAL, FRANK;HARVEY, ROBIN, J. |