发明名称 System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor device
摘要 A system for determining dry cleaning timing, includes: a manufacturing apparatus configured to process materials assigned by a sequence of lots; an apparatus controller configured to control the manufacturing apparatus and obtaining operational conditions of the manufacturing apparatus as apparatus information; a lot information input terminal configured to obtain process conditions of one of the lots as lot information; an apparatus information storage unit configured to store the apparatus information from the apparatus controller as an apparatus information database; a lot information storage unit configured to store the lot information from the lot information input terminal as a lot information database; and a cleaning determination unit configured to determine timing to perform a dry cleaning of the manufacturing apparatus based on the apparatus information database and the lot information database.
申请公布号 US2003139835(A1) 申请公布日期 2003.07.24
申请号 US20020231019 申请日期 2002.08.30
申请人 KATSUI SHUJI;TANAKA MASAYUKI;KAMIMURA MASAKI;AKAHORI HIROSHI;MIZUSHIMA ICHIRO;NAKAO TAKASHI;YAMAMOTO AKIHITO;SAIDA SHIGEHIKO;TSUNASHIMA YOSHITAKA;MIKATA YUUICHI 发明人 KATSUI SHUJI;TANAKA MASAYUKI;KAMIMURA MASAKI;AKAHORI HIROSHI;MIZUSHIMA ICHIRO;NAKAO TAKASHI;YAMAMOTO AKIHITO;SAIDA SHIGEHIKO;TSUNASHIMA YOSHITAKA;MIKATA YUUICHI
分类号 C23C16/44;B08B11/00;G05B19/05;H01L21/02;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H04L12/66;(IPC1-7):G06F19/00 主分类号 C23C16/44
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