发明名称 Lithographic apparatus and device manufacturing method
摘要 A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.
申请公布号 US2003137643(A1) 申请公布日期 2003.07.24
申请号 US20020305266 申请日期 2002.11.27
申请人 ASML NETHERLANDS B.V. 发明人 JACOBS HERNES;VOSTERS PIET;HOL SVEN ANTOIN JOHAN;VAN DER SCHOOT HARMEN KLAAS;VAN DIESEN ROBERT JOHANNES PETRUS;CALLAN DAVID WILLIAM
分类号 G03F7/20;H01L21/027;(IPC1-7):G03B27/42 主分类号 G03F7/20
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