| 发明名称 |
AQUEOUS STRIPPING AND CLEANING COMPOSITION |
| 摘要 |
The present invention relates to aqueous compositions used to remove post etch organic and inorganic residue as well polymeric residues and contaminants from semiconductor substrates. The compositions are comprised of a water soluble organic solvent, a sulfonic acid and water.
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| 申请公布号 |
WO03060045(A1) |
申请公布日期 |
2003.07.24 |
| 申请号 |
WO2003US00291 |
申请日期 |
2003.01.06 |
| 申请人 |
ASHLAND INC. |
发明人 |
EGBE, MATTHEW, I.;PETERS, DARRYL, W. |
| 分类号 |
B08B3/08;C09D9/00;C11D1/14;C11D1/22;C11D3/34;C11D3/43;C11D7/26;C11D7/32;C11D7/34;C11D7/50;C11D11/00;C23G5/02;G03F7/42;H01L21/02;H01L21/3213;H05K3/26;(IPC1-7):C11D1/62;C23G1/00;C23G1/02;C03C23/00;B08B3/00;B08B3/12;B08B6/00 |
主分类号 |
B08B3/08 |
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