发明名称 |
DEVELOPMENT OF LOW-FIRED TRANSPARENT GLAZE |
摘要 |
PURPOSE: Low-fired transparent glaze is provided, which enamel is applied at a temperature range of 800-1,150 deg.C by lowering the melting point, to prevent the cracking due to the difference in rate of expansion and contraction of a substrate and glaze. CONSTITUTION: The low-fired transparent glaze comprises raw glaze and frit. Preferably the low-fired transparent glaze comprises raw glaze and frit in the ratio of 80:20 in the case of the use at a temperature of 970 deg.C.
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申请公布号 |
KR20030062027(A) |
申请公布日期 |
2003.07.23 |
申请号 |
KR20020002396 |
申请日期 |
2002.01.15 |
申请人 |
KWON, EUN SOOK;LEE, JAE YEUN |
发明人 |
KWON, EUN SOOK;LEE, JAE YEUN |
分类号 |
C03C8/00;C03C17/00;C03C17/02;(IPC1-7):C03C8/00 |
主分类号 |
C03C8/00 |
代理机构 |
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代理人 |
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地址 |
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