发明名称 DEVELOPMENT OF LOW-FIRED TRANSPARENT GLAZE
摘要 PURPOSE: Low-fired transparent glaze is provided, which enamel is applied at a temperature range of 800-1,150 deg.C by lowering the melting point, to prevent the cracking due to the difference in rate of expansion and contraction of a substrate and glaze. CONSTITUTION: The low-fired transparent glaze comprises raw glaze and frit. Preferably the low-fired transparent glaze comprises raw glaze and frit in the ratio of 80:20 in the case of the use at a temperature of 970 deg.C.
申请公布号 KR20030062027(A) 申请公布日期 2003.07.23
申请号 KR20020002396 申请日期 2002.01.15
申请人 KWON, EUN SOOK;LEE, JAE YEUN 发明人 KWON, EUN SOOK;LEE, JAE YEUN
分类号 C03C8/00;C03C17/00;C03C17/02;(IPC1-7):C03C8/00 主分类号 C03C8/00
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