发明名称 Wiring board and fabricating method thereof, semiconductor device and fabricating method thereof, circuit board and electronic instrument
摘要 A conductive material is provided to an open end of a penetrating hole penetrating through at least a semiconductor element, on the side of a first surface of the semiconductor element. The conductive material is melted to flow into the penetrating hole. The conductive material is made to flow into the penetrating hole in a state that an atmospheric pressure on the side of a second surface of the semiconductor element opposite to the first surface is lower than an atmospheric pressure on the side of the first surface.
申请公布号 US6596634(B2) 申请公布日期 2003.07.22
申请号 US20020077820 申请日期 2002.02.20
申请人 SEIKO EPSON CORPORATION 发明人 UMETSU KAZUSHIGE;KURASHIMA YOHEI;AMAKO JUN
分类号 H05K1/11;H01L21/60;H01L21/768;H01L23/12;H01L23/48;H01L25/065;H01L25/07;H01L25/10;H01L25/11;H01L25/18;H05K1/14;H05K3/34;H05K3/40;(IPC1-7):H01L21/44 主分类号 H05K1/11
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