发明名称 Method of mounting fabrication-historical data for semiconductor device, and semiconductor device fabricated by such a method
摘要 A method of providing fabrication-historic data for a semiconductor device to a chip, has the step of: preparing a wafer with a pattern of a plurality of chips, where each chip has a product area to function as a semiconductor device and a fabrication-historical data area on which fabrication-historical data is to be held, wherein different fabrication-historical data is provided for each chip by exposing all of the chips on the wafer as a single unit by means of an exposure system using a mater mask while the product area of each chip is shielded from exposure or in one of the steps of forming the contact holes and carrying out wiring among the transistors. Consequently, the process can be easily performed because of the exposure in one operation using the master mask and thus the fabrication-historical data can be easily mounted on the chip.
申请公布号 US6598217(B1) 申请公布日期 2003.07.22
申请号 US20000634951 申请日期 2000.08.07
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 FUJIKAWA HIROSHI
分类号 H01L21/02;H01L21/66;H01L23/544;(IPC1-7):G06F17/50 主分类号 H01L21/02
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