发明名称 Shadow mask having particular design of upper and lower holes for improved strength and halation characteristics
摘要 In a shadow mask color cathode ray tube, its shadow mask is not easily deformed into a concave shape when an impact or a vibration is applied to the shadow mask, so that a good image can be displayed. The electron beam passing holes of the shadow mask are each formed of an upper hole etched from the panel side of the shadow mask and a lower hole etched from the electron-gun side of the shadow mask. In each electron beam passing hole located in the peripheral portion of the shadow mask, the ratio of an upper-side etching quantity to a lower-side etching quantity is controlled to be 1.8 or less. By adjusting the balance in strength relative to compressive stresses between the panel side and the electron-gun side of the shadow mask, it is possible to prevent the shadow mask from being deformed into a concave shape.
申请公布号 US6597092(B1) 申请公布日期 2003.07.22
申请号 US20000499515 申请日期 2000.02.09
申请人 HITACHI, LTD.;HITACHI DEVICE ENGINEERING CO., LTD. 发明人 FURUSAWA TAKEHARU;HOSOTANI NOBUHIKO;NAKANO YOSHIKI;OHSAKA HIDEYUKI
分类号 H01J9/14;H01J29/07;(IPC1-7):H01J29/07 主分类号 H01J9/14
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