发明名称 |
Lithographic projection apparatus and device manufacturing method |
摘要 |
A lithographic projection apparatus includes a radiation system for supplying a projection beam of radiation having a propagation direction, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the lithographic projection apparatus further includes a sensor for measuring a movement of the projection beam perpendicular to its propagation direction and a controller to control a received dose of the projection beam on a target portion of the substrate in response to an output from the sensor.
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申请公布号 |
US6597431(B2) |
申请公布日期 |
2003.07.22 |
申请号 |
US20010899560 |
申请日期 |
2001.07.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BENSCHOP JOZEF PETRUS HENRICUS;NOORDMAN OSCAR FRANSISCUS JOZEPHUS;RENKENS MICHAEL JOZEFA MATHIJS;LOOPSTRA ERIK ROELOF;BANINE VADIM YEVGENYEVICH;MOORS JOHANNES HUBERTUS JOSEPHINA;VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS |
分类号 |
G01B21/00;G03F7/20;H01L21/027;(IPC1-7):G03B27/72;G03B27/42 |
主分类号 |
G01B21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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