发明名称 Method for manufacturing semiconductor circuit
摘要 An object of the present invention is to provide with a method for manufacturing a semiconductor circuit by which a TFT including particles having a different threshold value is prevented from being operated even if such a TFT is locally formed.According to the present invention, after forming an amorphous silicon layer on a glass substrate, heat treatment and the like is performed to convert the amorphous silicon layer into a polycrystalline silicon layer. At this time, a particle having an abnormal grain diameter is generated in a polycrystalline silicon layer under the influence of foreign particles in a glass substrate, and a TFT having a different threshold value may be possibly formed. In this case, when the particle having an abnormal grain diameter is irradiated with a laser beam to be turned into a granule and a high resistance is given therearound, the TFT having a different threshold value is prevented from being operated, and a leak current does not flow during the off state of the original TFT, thereby improving the display characteristic.
申请公布号 US6596612(B2) 申请公布日期 2003.07.22
申请号 US20020085107 申请日期 2002.03.01
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ITO MINORU;NAKAMURA TAKAFUMI;HARADA MASANORI
分类号 G02F1/136;B23K15/00;B23K26/00;G02F1/1368;H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 主分类号 G02F1/136
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