发明名称 Integrated injection logic semiconductor device and method of fabricating the same
摘要 A logic circuit is formed of an I2L cell structure in which a difference of switching speeds at every collectors in a multi-collector structure is small. In a semiconductor device in which an integrated injection logic cell including a constant current source transistor and a switch transistor is formed on a common semiconductor substrate, a first semiconductor layer (13) doped with a first conductivity type impurity and a second semiconductor layer (19) doped with a second conductivity impurity are electrically isolated from each other on a semiconductor substrate. A plurality of collector electrodes of the switch transistor and a plurality of collector regions (20) based on diffusion of impurity are formed by the second semiconductor layer (19). The first semiconductor layer (13) includes a base electrode deriving portion, and a direct contact portion which directly contacts with the semiconductor substrate between a plurality of collector regions (20). An external base region (17) is formed by diffusion of first conductivity type impurity from the direct contact portion.
申请公布号 US6596600(B1) 申请公布日期 2003.07.22
申请号 US19980182520 申请日期 1998.10.30
申请人 SONY CORPORATION 发明人 GOMI TAKAYUKI
分类号 H01L27/082;H01L21/8226;H01L27/02;(IPC1-7):H01L21/822 主分类号 H01L27/082
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