发明名称 Planar-processing compatible metallic micro-extrusion process
摘要 Micromachined extrusions on the micrometer scale is realized using compressive stresses resulting from electromigration-induced mass transport in planarized conductors. Extrusions are formed through simple die patterns etched through a passivation layer overlaying the conductors.
申请公布号 US6594894(B1) 申请公布日期 2003.07.22
申请号 US20000578064 申请日期 2000.05.24
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE 发明人 BERNSTEIN GARY H.;FRANKOVIC RICHARD
分类号 B81C99/00;(IPC1-7):H01R43/02;B21C23/00 主分类号 B81C99/00
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