发明名称 |
Process to form a flux concentration stitched write head |
摘要 |
A general process for filling a trench is described with particular emphasis on the formation of step P1 during the manufacture of a magnetic write head. The main feature of this process is that a liftoff mask is used for both the trench formation and the filling processes. As a result of this approach, the area surrounding the trench is not disturbed, the trench depth is not reduced, and the original overall planarity, prior to etching and filling, is maintained.
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申请公布号 |
US6596468(B1) |
申请公布日期 |
2003.07.22 |
申请号 |
US20000659790 |
申请日期 |
2000.09.11 |
申请人 |
HEADWAY TECHNOLOGIES, INC. |
发明人 |
HAN CHERNG-CHYI;CHEN MAO-MIN;JU KOCHAN |
分类号 |
G03F7/00;G11B5/31;(IPC1-7):G03C5/56 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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