发明名称 HIGHLY PURE AND SUPERFINE SiOx POWDER, AND PRODUCTION METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To produce highly pure and superfine SiOx (x=0.6 to 1.8) powder in which specific surface area is≥10 m<SP>2</SP>/g, and the total content of Na, Fe, Al and Cl is≤10 ppm. SOLUTION: Gaseous monosilane and an oxidizing gas of the gaseous monosilane are reacted at 500 to 1,000°C in a nonoxidizing atmosphere under the pressure of 10 to 1,000 kPa, so that the highly pure and superfine SiOx (x=0.6 to 1.8) powder in which specific surface area is≥10 m<SP>2</SP>/g, and the total content of Na, Fe, Al and Cl is≤10 ppm can be produced. In this case, the content of the nonoxidizing gas is preferably made higher than the total content of the amounts of oxygen used for the oxidation reaction of the gaseous monosilane and the oxidizing gas of the gaseous monosilane. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003206126(A) 申请公布日期 2003.07.22
申请号 JP20020003226 申请日期 2002.01.10
申请人 DENKI KAGAKU KOGYO KK 发明人 IMAMURA YASUO;NONOGAKI RYOZO
分类号 C01B33/18;C01B33/113;C04B35/14;C23C16/44;(IPC1-7):C01B33/18 主分类号 C01B33/18
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