发明名称 Method and device for simultaneous arc processing and chemical etching
摘要 The present invention relates to an arc processing method and device with simultaneous chemical etching wherein the device comprises a conductive electrode, being the cathode, an auxiliary electrode, being the anode, an conductive fluid, and an non-conductive work piece for processing. Processing, and precision processing in particular, of non-conductive materials is obtained by simultaneous arc discharge and etching that are brought about by chemical reactions associated with cathode and anode. Moreover, the present invention discloses simultaneous arc processing and chemical etching that offers improved processing efficiency over conventional arc processing.
申请公布号 US6596152(B2) 申请公布日期 2003.07.22
申请号 US20010779653 申请日期 2001.02.09
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 YANG CHING-TANG;TSAI HUNG-YIN;WU TUNG-CHUAN
分类号 B23H5/02;(IPC1-7):B23H3/00;B23H5/00;C25D17/00 主分类号 B23H5/02
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