发明名称 Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
摘要 Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates. The copolymer contains about 25 to 55 mol % of unit A which has the formulaThe copolymer contains about 0.5 to 25 mol % of unit B which has the formulawherein R1 is selected from the group consisting of alkyl, aryl and aralkyl.The copolymer contains about 0.5 to 40 mol % of unit C which has the formulawherein X is an aliphatic or aromatic spacer group, and Ac is an acidic group selected from the group consisting of -COOH, -SO3H, -SO2NR9R10 with R9 and R10 independently being selected from hydrogen and alkyl; and when X is phenylene, Ac can also be OH.The copolymer contains about 20 to 70 mol % of unit D which has the formulawherein Ci is selected from the group consisting of Ci-1, Ci-2, Ci-3 and Ci-4 which are represented by the following formulaewherein:k, m and n are integers independently selected from 0 to 5,R3, R4 and R7 are independently selected from the group consisting of alkyl, alkoxy, -COOR8, -NR9R10, -NH-CO-CH3, halogen, and cyano,R8 is selected from hydrogen and alkyl,R9 and R10 are independently selected from hydrogen and alkyl,R5 is selected from the group consisting of hydrogen, alkyl, aryl and aralkyl,R6 is selected from the group consisting of alkyl, aryl and aralkyl andY is selected from the group consisting of alkylene, arylene and arylenealkylene.The copolymer contains about 0 to 50 mol % of unit E which has the formulawherein R2 is selected from the group consisting of alkyl, aryl and aralkyl groups.
申请公布号 US6596456(B2) 申请公布日期 2003.07.22
申请号 US20020119392 申请日期 2002.04.11
申请人 KODAK POLYCHROME GRAPHICS LLC 发明人 BAUMANN HARALD;FLUGEL MICHAEL;KOTTMAIR EDUARD
分类号 C08F8/30;G03F7/021;G03F7/038;(IPC1-7):G03F7/021;G03F7/30;C08F16/38 主分类号 C08F8/30
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