发明名称 |
Apparatus and method of inspecting foreign particle or defect on a sample |
摘要 |
A system and method of inspecting a foreign particle or a defect on a sample are provided. Such a method comprises irradiating light to an object to be inspected; detecting reflected light or scattered light from the object to be inspected irradiated with the light; detecting a signal of the foreign particle or the defect from the detected signal; providing information related to a size of the foreign particle or the defect from the signal of the detected foreign particle or the defect; and outputting information on a display screen a distribution of the size of the foreign particle or defect with information indicating a cause of the distribution of the foreign particle or defect.
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申请公布号 |
US6597448(B1) |
申请公布日期 |
2003.07.22 |
申请号 |
US20000644069 |
申请日期 |
2000.08.23 |
申请人 |
HITACHI, LTD.;HITACHI ELECTRONICS ENGINEERING CO., LTD. |
发明人 |
NISHIYAMA HIDETOSHI;NOGUCHI MINORI;OHSHIMA YOSHIMASA;WATANABE TETSUYA;NAKAMURA HISATO;JINGU TAKAHIRO;INOUE YUKO;SAIKI KEIICHI;WATANABE KENJI |
分类号 |
G01N21/898;(IPC1-7):G01N21/88 |
主分类号 |
G01N21/898 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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