发明名称 Apparatus and method of inspecting foreign particle or defect on a sample
摘要 A system and method of inspecting a foreign particle or a defect on a sample are provided. Such a method comprises irradiating light to an object to be inspected; detecting reflected light or scattered light from the object to be inspected irradiated with the light; detecting a signal of the foreign particle or the defect from the detected signal; providing information related to a size of the foreign particle or the defect from the signal of the detected foreign particle or the defect; and outputting information on a display screen a distribution of the size of the foreign particle or defect with information indicating a cause of the distribution of the foreign particle or defect.
申请公布号 US6597448(B1) 申请公布日期 2003.07.22
申请号 US20000644069 申请日期 2000.08.23
申请人 HITACHI, LTD.;HITACHI ELECTRONICS ENGINEERING CO., LTD. 发明人 NISHIYAMA HIDETOSHI;NOGUCHI MINORI;OHSHIMA YOSHIMASA;WATANABE TETSUYA;NAKAMURA HISATO;JINGU TAKAHIRO;INOUE YUKO;SAIKI KEIICHI;WATANABE KENJI
分类号 G01N21/898;(IPC1-7):G01N21/88 主分类号 G01N21/898
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