| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent deterioration of display quality such as 'block pattern separation' by forming uniform MIM (metal-insulator-metal) elements on a substrate by using a sequential exposing method. <P>SOLUTION: In forming the MIM elements on an MIM liquid crystal panel with photolithography, patterns on a specified layer are sequentially exposed by repeatedly using an identical photomask. As difference in pattern dimension between masks caused by variation in photomask manufacturing is eliminated, the pattern dimensions of the MIM elements are made constant. Consequently as capacitance of the MIM elements is made constant, effective voltage written in the elements becomes uniform and as result uneven contrast in a screen of the liquid crystal panel is dissolved. <P>COPYRIGHT: (C)2003,JPO</p> |
