| 摘要 |
PROBLEM TO BE SOLVED: To correct measurement error related to a slope of a wafer stage due to the flatness of a plane mirror. SOLUTION: A positioning stage is provided with plane mirrors 2A and 2B, extending in two directions approximately perpendicular for measuring slope in the translational and height direction, a first measurement unit 3A-1 which irradiates laser and measures the position in the translational direction by using reflection, a second measurement unit 3A-2 which measures the position at a position separated in the vertical direction from the first measurement unit to measure the slope of the stage, third measurement units 14-1, 2, and 3 which measure the slope in the height direction of the stage and the surface plate surface, a calculation part which calculates errors in the plane mirror corresponding to each stage position, based on the difference between a first inclined amount based on the difference between measurement results of the first and the second measurement units and a second inclined amount measured by the third measurement unit, and a control part which drives the stage by correcting the first inclined amount according, to a position to which the stage moves based on the error predetermined by the calculation part. COPYRIGHT: (C)2003,JPO
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