发明名称 IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: An image sensor and a method for manufacturing the same are provided to be capable of preventing the decrease of a driving range according to the reduction of the size of a photodiode. CONSTITUTION: An image sensor is provided with a semiconductor layer(22), the first and second gate electrode(25a,25b) located and spaced apart from each other on the semiconductor layer, a photodiode(26) arranged at one edge portion of the first gate electrode in the semiconductor layer, and a floating diffusion region(29) overlaid with the other edge portion of the first gate electrode and spaced apart from one edge portion of the second gate electrode as much as the width overlaid between the floating diffusion region and the first gate electrode.
申请公布号 KR20030061109(A) 申请公布日期 2003.07.18
申请号 KR20020001481 申请日期 2002.01.10
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, WON HO
分类号 H01L27/146;(IPC1-7):H01L27/146 主分类号 H01L27/146
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