SEMICONDUCTOR WAFER ETCHING APPARATUS BY WET STATION

摘要

PURPOSE: A semiconductor wafer etching apparatus by a wet station is provided to be capable of uniformly etching a wafer when conserving the wafer in a bath filled with chemicals by using a wafer rotating part. CONSTITUTION: A semiconductor wafer etching apparatus is provided with a bath(13) capable of storing chemicals(11), a boat(15) installed in the bath(13) for loading a plurality of wafers(W), and a wafer rotating part(20) installed at the lower portion of the boat for rotating the wafers loaded on the boat(15). Preferably, a rotating bar(21) used as the wafer rotating part(20), is installed across the inner portion of the bath(13) for simultaneously rotating a plurality of wafers. At this time, the rotating bar(21) contacts edge portions of the wafers.