发明名称 MULTIGATES THIN FILM TRANSISTOR EMPLOYING MILC AND METHOD OF MANUFACTURING THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor and a method of manufacturing thereof, in such a manner that multi gates can be realized without increasing the size. SOLUTION: The thin film transistor includes a semiconductor layer of zigzag shape, which is formed on a insulating substrate and a gate pole providing at least one slot which intersects the semiconductor layer. The semiconductor layer includes at least two or more body members, intersecting the gate pole and at least one or more connection members making the adjacent body members connected with each other. The portion overlapped with the semiconductor layer in the gate pole acts as multigates and has a MILC face on the portion which is not intersected with the gate pole in the semiconductor layer. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003203928(A) 申请公布日期 2003.07.18
申请号 JP20020358617 申请日期 2002.12.10
申请人 SAMSUNG SDI CO LTD 发明人 SO UEI
分类号 H01L21/20;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/423;H01L29/786;(IPC1-7):H01L21/336 主分类号 H01L21/20
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