发明名称 ELECTRON BEAM DEVICE AND METHOD OF MANUFACTURING DEVICE USING THIS ELECTRON BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam device capable of reducing shot noise of an electron beam, capable of increasing a beam current, capable of forming a molding beam by only two-stage lenses, and operable with high stability. SOLUTION: This electron beam device detects a secondary electron emitted from a sample surface by irradiating a sample with the electron beam emitted from an electron gun. The electron gun 11 is a thermoelectron emitting electron gun. A molding opening 13 and a NA opening 16 are arranged in front of the thermoelectron emitting electron gun 11. An image of the molding opening 13 by the electron beam C emitted from the thermoelectron emitting electron gun 11 is formed on the sample surface only by the two-stage lenses 17 and 20. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003203596(A) 申请公布日期 2003.07.18
申请号 JP20020002233 申请日期 2002.01.09
申请人 EBARA CORP 发明人 NAKASUJI MAMORU;KATO TAKAO;SATAKE TORU;WATANABE KENJI;MURAKAMI TAKESHI
分类号 H01L21/66;H01J37/06;H01J37/09;H01J37/141;H01J37/28;H01L21/027;(IPC1-7):H01J37/28 主分类号 H01L21/66
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