| 摘要 |
PURPOSE: Provided are a photoresist polymer comprising a pyrazoline-based monomer having azide group, which is an eco-friendly, and has excellent storage stability and shows high resolution and sensitivity, and a photoresist composition. CONSTITUTION: The pyrazoline-based monomer is represented by formula 1. In the formula 1, R is CHO, COOH or (CH3)2OCH(CH2)m, m is 0, 1, or 2, R' is CH3 or C6H5, M is H or an element capable of converting into cation in aqueous solution. The photoresist polymer comprising the pyrazoline-based monomer is represented by formula 5. In the formula 5, each of R' and M is the same as the above formula 1, x, y and z are a molar ratio of each monomer, each of x and y is 0.7-0.99, z is 0.01-0.3, m is 0, 1 or 2, and n is a polymerization degree of each polymer and has a value of 2 or more.
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