发明名称 APPARATUS AND METHOD FOR PLASMA DISCHARGE
摘要 <P>PROBLEM TO BE SOLVED: To provide an apparatus having electrodes capable of performing atmospheric plasma discharge even when the treatment temperature is as high as 300&deg;C, the discharge is performed in a high output state, and durable for a long-term continuous operation, and to provide an atmospheric plasma discharge apparatus and an atmospheric plasma discharge method capable of depositing a thin film on a base material at high speed with high performance. <P>SOLUTION: In the plasma discharge apparatus, the reaction gas containing a reactive gas between the electrodes and rare gas is in a plasma state by applying the high frequency voltage under the atmospheric pressure or under the pressure nearby between the electrodes facing each other to perform the discharge, the base material is exposed to the reaction gas in a plasma state to deposit a thin film on the base material. A base metal of the electrodes is a titanium alloy containing &ge;70 mass % titanium, or titanium metal. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003201568(A) 申请公布日期 2003.07.18
申请号 JP20020002272 申请日期 2002.01.09
申请人 KONICA CORP 发明人 KONDO YOSHIKAZU;FUKUDA KAZUHIRO;TODA YOSHIRO;OISHI KIYOSHI;NISHIWAKI AKIRA
分类号 H05H1/46;B01J19/08;C23C16/507 主分类号 H05H1/46
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