发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition very excellent in sensitivity, adhesion, chemical resistance, flexibility and property of not contaminating a plating bath and a method for producing a printed wiring board using the composition. <P>SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in one molecule and (C2') an onium salt compound, wherein (A) the binder polymer is a binder polymer containing (A') styrene or a styrene derivative as a copolymerized component or (B) the photopolymerizable compound is (B') a bisphenol A type (meth)acrylate compound or (B") a photopolymerizable compound having a urethane bond. A photosensitive element produced using the photosensitive resin composition is provided. In the method for producing the printed wiring board, the photosensitive element is used. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003202668(A) 申请公布日期 2003.07.18
申请号 JP20020306363 申请日期 2002.10.21
申请人 HITACHI CHEM CO LTD 发明人 NATORI MICHIKO
分类号 G03F7/027;C08F2/50;C08F257/02;G03F7/004;G03F7/029;H05K3/06;H05K3/18 主分类号 G03F7/027
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