发明名称 SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To secure transfer and processing margins without complicatedly deforming a gate shape, when gate wires of a semiconductor storage device are formed. <P>SOLUTION: This semiconductor storage device comprises a memory call array, constituted by arranging memory cells equipped with two groups of driver transistors, load transistors, and access transistors on a semiconductor substrate in two dimensions, a plurality of word lines which are arranged in parallel with a 1st direction, a plurality of bit lines which are arranged in parallel with a 2nd direction orthogonal to the 1st direction, a 1st rectangular wire which connects the 1st group of driver transistors and load transistors and has a straight side, a 2nd rectangular gate wire which is connected to the access transistors and has a straight side, a 1st LIC which connects the 1st gate wire and 2nd group of driver transistors and load transistors, and a 2nd LIC which connects the 2nd gate wire and word lines. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003203993(A) 申请公布日期 2003.07.18
申请号 JP20020003266 申请日期 2002.01.10
申请人 MITSUBISHI ELECTRIC CORP 发明人 TOMITA HIDEMIKI;OBAYASHI SHIGEKI;ISHIGAKI YOSHIYUKI
分类号 H01L21/3205;H01L21/8244;H01L27/11 主分类号 H01L21/3205
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