发明名称 LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method of manufacturing devices. SOLUTION: Undesirable vibrations of optical elements 10, 50, and 60 are reduced in the projection system of a lithographic projection apparatus, using reaction masses 14, 54, and 64 and actuators 15, 55, and 65. The reactive masses 14, 54, and 64 can be mechanically connected only to optical elements 50, 60 or can also be mounted compliantly to a projection system frame 11. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003203860(A) 申请公布日期 2003.07.18
申请号 JP20020367679 申请日期 2002.12.19
申请人 ASML NETHERLANDS BV 发明人 COX HENDRIKUS HERMAN MARIE;AUER FRANK;VAN DER WIJST MARC WILHELMUS MARIA;JANSEN BASTIAAN STEPHANUS HENDRIKUS;FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS
分类号 H01L21/027;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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