AQUEOUS ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOMASK AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a high precision and low defect photomask for KrF excimer laser lithography capable of being manufactured in a reduced number of processes.

SOLUTION: This photomask for the KrF excimer laser lithography is obtained by directly forming on a quartz glass substrate 10 a resist pattern 18 which absorbs a KrF excimer laser light (wavelength; about 248 nm) efficiently. The resist pattern 18 comprises a photosensitive resin mainly composed of a highly light-shielding, aqueous alkali-soluble resin to which a naphthol structure in which at least one hydroxyl group is bound to a naphthalene nucleus is incorporated or an aqueous alkali-soluble resin derivative is used as a polymeric resin matrix.

COPYRIGHT: (C)2003,JPO